Description
The Edwards Signaling B722-01-000 Turbomolecular Pump is a high-vacuum, ISO63-flanged turbomolecular pump engineered for efficient evacuation of systems requiring ultra-clean, low-pressure operation. Featuring a pumping speed of 65 L/s for nitrogen and an ultimate pressure of 3.75 × 10⁻⁹ Torr, it delivers precise, high-performance vacuum generation for analytical, semiconductor, and research applications.
Technical Specifications
| Condition |
New/Never Used Surplus |
| Brand |
Edwards Signaling |
| Category |
Industrial Vacuum Equipment |
| Part Number |
B722-01-000 |
| Subcategory |
Turbomolecular Pumps |
| Type |
High-Vacuum Turbomolecular Pump |
| Inlet Flange |
ISO63 |
| Exhaust Port |
KF16 |
| Vent Valve Type |
Manual thumbscrew |
| Pumping Speed (N₂) |
65 L/s |
| Compression Ratio (N₂) |
> 1 × 10⁸ |
| Ultimate Pressure |
3.75 × 10⁻⁹ Torr |
| Gas Type |
Nitrogen (N₂) and compatible process gases |
| Operation Mode |
Continuous duty |
| Cooling Method |
Air or optional water cooling (series dependent) |
| Mounting Orientation |
Any orientation (balanced rotor design) |
| Bearing Type |
Hybrid or magnetic bearing (series typical) |
| Materials of Construction |
High-grade aluminum and stainless steel |
| Noise Level |
Low, typical of turbomolecular pumps (< 50 dB) |
| Operating Temperature Range |
0°C to 40°C |
| Vacuum Compatibility |
High and ultra-high vacuum systems |
| Power Requirement |
Supplied via compatible controller unit |
| Protection Class |
IP40 (pump body) |
| Weight |
Approx. 5–6 kg (typical for size) |
| Applications |
Semiconductor process chambers, analytical instruments, research vacuum systems |
| Country of Origin |
United Kingdom |
Information About B722-01-000
The B722-01-000 belongs to Edwards’ family of high-vacuum turbomolecular pumps, designed to provide clean, vibration-free performance for demanding vacuum systems. It features an ISO63 inlet flange and a KF16 exhaust connection, ensuring compatibility with standard vacuum hardware. With a compression ratio greater than 1 × 10⁸ for nitrogen, this pump offers exceptional gas handling capability and ultra-low backstreaming characteristics. Its vent valve with a manual thumbscrew enables controlled venting and pressure equalization. Engineered with precision-balanced rotor assemblies and magnetic or hybrid bearings (series dependent), the B722-01-000 ensures long operational life and minimal maintenance in continuous or batch vacuum applications.
Key Features:
- High Pumping Speed: 65 L/s for nitrogen, ensuring rapid evacuation of process chambers.
- Ultra-High Vacuum Performance: Achieves ultimate pressure down to 3.75 × 10⁻⁹ Torr.
- Exceptional Compression Ratio: Greater than 1 × 10⁸ for nitrogen, minimizing gas backflow.
- ISO63 Inlet Flange: Standardized inlet for easy integration into existing vacuum systems.
- KF16 Exhaust Port: Compact, compatible exhaust interface for efficient system layout.
- Manual Vent Valve: Integrated thumbscrew design for controlled venting and system protection.
- Clean Operation: Oil-free design eliminates contamination risk for sensitive applications.
- Precision Construction: Engineered for reliability in high-performance vacuum and analytical systems.
The B722-01-000 delivers the reliability and precision required for high-vacuum generation in laboratory, semiconductor, and research-grade environments.
